A new gas purifier for ArF excimer lasers

被引：4

作者：

Ito, S

Saito, T

Tada, A

机构：

[1] Opto-Electronics Res. Laboratories, NEC Corporation, Miyamae-ku, Kawasaki, Kanagawa 216, 1-1, Miyazaki

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1996年 / 67卷 / 03期

关键词：

D O I：

10.1063/1.1146837

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We have developed a new gas purifier for ArF excimer lasers that can remove all the impurities from degraded ArF excimer laser gas. We found that cooled activated charcoal at temperatures below -50 degrees C effectively removes CF4, which is the preponderant impurity generated in ArF excimer laser gas mixtures. We also demonstrated that the new gas purifier can regenerate the ArF excimer laser gas up to its initial purity level after about 1X10(9) shots of operation. (C) 1996 American Institute of Physics.

引用

页码：658 / 661

页数：4

共 9 条

[1]

ARAI M, 1991, UNPUB CLEO91

[2] ANALYSIS OF CHEMICAL DEGRADATION PRODUCTS IN AN E-BEAM PUMPED RARE-GAS HALIDE LASER [J].