Highly conductive flexible ultra thin ITO nanoclusters prepared by 3-D confined magnetron sputtering at a low temperature

被引：29
作者：
Sahu, Bibhuti Bhusan [1 ]
Long, Wen [1 ]
Han, Jeon Geon [1 ]
机构：
[1] Sungkyunkwan Univ, Ctr Adv Plasma Surface Technol, NU SKKU Joint Inst Plasma Nano Mat, Dept Adv Mat Sci & Engn, Suwon 440746, South Korea
来源：
SCRIPTA MATERIALIA | 2018年 / 149卷
基金：
新加坡国家研究基金会;
关键词：
Nanocluster deposition; Indium tin oxide; TCO films; 3-D confined magnetron sputtering; Low temperatures; INDIUM-TIN OXIDE; DEPOSITION; CLUSTER; FILMS; SPECTROSCOPY; GROWTH;
D O I：
10.1016/j.scriptamat.2018.02.018
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Flexible ultra-thin indium oxide films (UT-ITOs) of 30-50 nm thick, with crystallized nanoclusters (NCs), exhibiting excellent resistivity as low as similar to 5.6 x 10(-4) Omega cm are deposited at similar to 80 degrees C without heating using a new 3-D confined magnetron source (3DMS). Material characteristics are purposefully investigated in light of NC formation. Also, the measured NC sizes are reasonably comparable to the theoretically estimated values obtained using a two-body collision model that reveals the formation of NCs by add-atoms. (C) 2018 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码：98 / 102
页数：5
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