Laser Induced Damage Threshold and Optical Properties of TiO2 and Al2O3 - Coatings Prepared by Atomic Layer Deposition

被引：4

作者：

Jensen, Lars O. ^{[1
]}

Maedebach, Heinrich ^{[1
]}

Maula, Jarmo ^{[2
]}

Guertler, Karlheinz ^{[3
]}

Ristau, Detlev ^{[1
]}

机构：

[1] Laser Zentrum Hannover eV, Dept Laser Components, Hollerithallee 8, D-30419 Hannover, Germany

[2] Beneq Oy Ensimmainen Savu, Vantaa 01510, Finland

[3] Surface & Thin Film Consulting, D-64372 Ober Ramstadt, Germany

来源：

LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 2012 | 2012年 / 8530卷

关键词：

Atomic Layer Deposition; LIDT; Al2O3/TiO2; HR; 1064nm;

D O I：

10.1117/12.976859

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Atomic Layer Deposition (ALD) allows for the deposition of homogeneous and conformal coatings with superior microstructural properties and well controllable thickness. As a consequence, ALD-processes have moved into the focus of optical thin film research during the last decade. In contrast to this, only a relatively small number of investigations in the power handling capability of ALD-coatings have been reported until now. The present contribution summarizes results of a study dedicated to the optical properties of single layers and high reflecting coating systems of TiO2 and Al2O3 deposited by ALD. Besides Laser Induced Damage Threshold (LIDT) values, the spectral characteristics as well the absorption and scatter losses are discussed.

引用

页数：8

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