Controllable fabrication of two-dimensional compound photonic crystals by single-exposure holographic lithography

被引：23

作者：

Mao, Weidong ^{[1
]}

Liang, Guanquan ^{[1
]}

Zou, Hui ^{[1
]}

Wang, Hezhou ^{[1
]}

机构：

[1] Zhongshan Sun Yat Sen Univ, State Key Lab Optoelectr Mat & Technol, Guangzhou 510275, Peoples R China

来源：

OPTICS LETTERS | 2006年 / 31卷 / 11期

关键词：

D O I：

10.1364/OL.31.001708

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We demonstrate an approach of single-exposure holographic lithography for controllable fabrication of large-scale two-dimensional square and hexagonal compound photonic crystals. In the sublattices, both circular and elliptical micropores on a 100 nm scale can be achieved. Theoretical analysis reveals that the inverse structure of a sample possesses a unique complete photonic bandgap pair in high frequency regions. This method is very robust for the general fabrication of complex periodic microstructures on the optical scale. (c) 2006 Optical Society of America

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页码：1708 / 1710

页数：3

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