Femtosecond Laser Assisted Multi-Ion Implantation in Dielectrics

We report the simultaneous implantation of metal ions namely Te4+, Zn2+ and Na+ along with the rare-earth ion Er3+ using a femtosecond laser ablation and deposition process. Planar waveguide structures with 1.3 mu m deep uniform diffusion with a maximum refractive index change (Delta n(max)) of 0.169 was produced in silica. This novel process will be explained using existing models with experimental verification. It has a potential to produce new materials and structures which are otherwise impossible to achieve via conventional glass and thin-film fabrication techniques. The unique possibility of diffusing rare earth ions opens new realm of photonic devices engineering.