Simulation and optimization of high-purity trichlorosilane distillation process with analysis of material properties

被引:1
|
作者
Zhang, Yuandi [1 ]
Xie, Gang [2 ]
Hou, Yanqing [2 ]
机构
[1] Kunming Univ Sci & Technol, City Coll, Kunming 650051, Yunnan, Peoples R China
[2] Kunming Univ Sci & Technol, Fac Met & Energy Engn, Kunming 650093, Yunnan, Peoples R China
来源
ADVANCED RESEARCH ON INDUSTRY, INFORMATION SYSTEM AND MATERIAL ENGINEERING | 2013年 / 675卷
关键词
polysilicon; trichlorosilane; distillation; simulation and optimization;
D O I
10.4028/www.scientific.net/AMR.675.196
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The new two-tower process of thrichlorosilane distillation consisting of removal of light components after removing heavy components is analyzed by assistant of a chemical process simulation software. In order to achieve lower energy consumption, the parameters for each tower in the new process are optimized, such as the number of theoretical plates, the position of feed plate, reflux ratio and distillate (bottoms) to feed ratio. The results show that the optimum parameters for the first tower are the number of theoretical plates of 32, the position of feed plate of 24, reflux ratio of 2.5 and the distillate to feed ratio of 0.8516. For the second tower, the number of theoretical plates, the position of feed plate, the reflux ratio and the bottoms to feed ratio are 80, 16, 143 and 0.9652 respectively. Applying the optimized results in practical production, mass fraction of PCl3 in overhead of the first tower is reduced by two orders of magnitude, condenser duty and reboiler duty of the second tower are dropped by more than eight percent while obtaining higher purity trichlorosilane products.
引用
收藏
页码:196 / +
页数:2
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