Highly moisture-proof polysilsesquioxane coating prepared via facile sol-gel process

被引：4
作者：
Yang, DJ [1 ]
Xu, Y
Zhang, L
Zhai, SR
Wu, D
Sun, YH
机构：
[1] Chinese Acad Sci, Grad Sch, Beijing 100864, Peoples R China
[2] Chinese Acad Sci, Inst Coal Chem, State Key Lab Coal Convers, Taiyuan 030001, Peoples R China
来源：
JCT RESEARCH | 2006年 / 3卷 / 02期
关键词：
atomic force microscopy; FTIR; ATR; NMR; UV spectroscopy; organosilane; moisture resistance; sol-gel; polysilsesquioxane; silica; bis-silylated precursor;
D O I：
10.1007/s11998-006-0015-4
中图分类号：
O69 [应用化学];
学科分类号：
081704 ;
摘要：
A highly moisture-proof polysilsesquioxane coating was obtained from a new bis-silylated precursor, which was synthesized from 3-aminopropyltriethoxysilane (APTES) and m-xylylene diisocyanate (m-XDI) in tetrahydrofuran (THF) and verified by H-1 MAS NMR. For direct comparison purposes, an SiO2 coating was also prepared by the Stober method using tetraethoxysilane (TEOS) as the reactant. Interestingly, the coating obtained from the polysilsesquioxane sol exhibited a much higher moisture resistance capability than its counterpart, which was attributed to its more compact feature between nanoparticles as characterized by N-2 absorption experiment and transmission electron microscopy (TEM). Furthermore, its high transparency of about 92% showed potential for application in the protection of optical crystals.
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收藏
页码：127 / 131
页数：5
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