Co-creation as a risk-sharing strategy for the development of innovative EUV lithography technology in the semiconductor industry

被引：8

作者：

Banerjee, Subhojit ^{[1
]}

Sharma, Anuj K. ^{[2
]}

机构：

[1] Gautam Buddha Univ, Sch Management, Greater Noida 201312, India

[2] Natl Inst Technol Delhi, Dept Appl Sci, Delhi 110040, India

来源：

TECHNOLOGY ANALYSIS & STRATEGIC MANAGEMENT | 2015年 / 27卷 / 09期

关键词：

EUV; ASML; co-creation; NTD; risk-sharing; PRODUCT; PERFORMANCE; ADOPTION; USERS;

D O I：

10.1080/09537325.2015.1060311

中图分类号：

C93 [管理学];

学科分类号：

12 ; 1201 ; 1202 ; 120202 ;

摘要：

Co-creation is becoming an innovative way for new technology development (NTD). We propose a four-staged co-creation model drawn upon a backdrop of 'knowledge cloud' for value creation and long-term customer commitment resulting in risk-sharing associated with NTD. The model is elaborated through the case of a leading semiconductor lithography equipment manufacturer (ASML) developing a new extreme ultraviolet lithography technology by engaging the major stakeholders in customer co-investment programme. The model is generic and applicable to any technology-driven industry and may include more stakeholders of same or allied technology.

引用

页码：1097 / 1113

页数：17

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