Siliciding of titanium carbides with gaseous SiO

Titanium carbides of different stoichiometries were silicided with gaseous SiO at 1350A degrees C. A mechanical mixture of silicon and silicon dioxide was used as a reaction source of SiO. Ti3SiC2, TiSi2, and Ti5Si3 were the main reaction products, the phase composition of which strongly depended on the titanium carbide stoichiometry. The siliciding of carbides with a nearly stoichiometric carbon content resulted in the formation of Ti3SiC2, on the surface of which the other silicide phases, such as Ti5Si3 and TiSi2, began to form. For titanium carbides with a low carbon concentration, Ti5Si3 was the only siliciding product.