Effect of CO2 addition on diamond growth by DC arc plasma jet chemical vapour deposition

被引：9

作者：

Higa, A ^{[1
]}

Hatta, A ^{[1
]}

Ito, T ^{[1
]}

Toguchi, M ^{[1
]}

Hiraki, A ^{[1
]}

机构：

[1] OSAKA UNIV,FAC ENGN,SUITA,OSAKA 565,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1996年 / 35卷 / 1A期

关键词：

diamond film; chemical vapour deposition; dc arc plasma jet; CO2; addition; Raman spectroscopy; optical emission spectroscopy;

D O I：

10.1143/JJAP.35.216

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The effect of adding carbon dioxide (CO2) to the reactant gases was studied in a dc arc plasma jet chemical vapour deposition (CVD) for the synthesis of diamond films. The fabricated films were characterized by Raman scattering spectroscopy and scanning electron microscopy. Without CO2, Raman spectra of these films display only graphitic peaks. As CO2 is added, faceted diamond crystal is observed in micrographs from scanning electron microscopy and a sharp diamond peak in the Raman spectrum appears. At a CO2/CH4 ratio of 2.0, diamond films exhibit a pure diamond Raman peak at 1333 cm(-1) with small nondiamond carbon peaks. In addition, plasma diagnosis was performed using optical emission spectroscopy.

引用

页码：216 / 220

页数：5

共 11 条

[1]

AOYAMA K, 1993, DIAM RELAT MATER, V2, P37

[2] TOWARDS A GENERAL CONCEPT OF DIAMOND CHEMICAL VAPOR-DEPOSITION [J].