Structural and Optical Properties of High Bi Content GaSbBi Films Grown by Molecular Beam Epitaxy

被引:0
作者
Yue, Li [1 ]
Zhang, Yanchao [1 ]
Zhang, Fan [1 ]
Wang, Lijuan [1 ]
Zhuzhong, Yunshen [1 ]
Liu, Juanjuan [1 ]
Wang, Shumin [1 ,2 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, 865 Changning Rd, Shanghai 200050, Peoples R China
[2] Chalmers, Dept Microtechnol & Nanosci, S-41296 Gothenburg, Sweden
来源
2016 COMPOUND SEMICONDUCTOR WEEK (CSW) INCLUDES 28TH INTERNATIONAL CONFERENCE ON INDIUM PHOSPHIDE & RELATED MATERIALS (IPRM) & 43RD INTERNATIONAL SYMPOSIUM ON COMPOUND SEMICONDUCTORS (ISCS) | 2016年
关键词
GaSbBi; dilute bismide; molecular beam epitaxy; photoluminescence;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
GaSb1-xBix thin films with 0 <= x <= 13% were grown by molecular beam epitaxy. The Bi content, lattice expansion and crystal structure were investigated by Rutherford backscattering spectroscopy, X-ray diffraction and transmission electron microscopy. Photoluminescence spectra of the GaSb1-xBix alloys with various Bi contents were studied at 77 K. The bandgap energy of GaSb1-xBix is decreased effectively as Bi content increasing. The PL peak energy of the 13% Bi content GaSb1-xBix is extended to 2.43 mu m, indicating that GaSb1-xBix alloys has potentials in mid-infrared applications.
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页数:2
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