Postgrowth Annealing of CdTe Layers Grown on Si Substrates by Metalorganic Vapor-Phase Epitaxy

被引:6
作者
Yasuda, K. [1 ]
Niraula, M. [1 ]
Namba, S. [1 ]
Kondo, T. [1 ]
Muramatsu, S. [1 ]
Yamashita, H. [1 ]
Wajima, Y. [1 ]
Agata, Y. [1 ]
机构
[1] Nagoya Inst Technol, Grad Sch Engn, Showa Ku, Nagoya, Aichi 4668555, Japan
基金
日本学术振兴会;
关键词
CdTe/Si; MOVPE; rapid thermal annealing; radiation detectors; GAMMA-RAY DETECTORS; THICK CDTE; FABRICATION;
D O I
10.1007/s11664-013-2680-2
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Annealing conditions of CdTe layers grown on Si substrates by metalorganic vapor-phase epitaxy were studied. Typically, 3-mu m-thick n-type (211) CdTe layers were annealed for 60 s in flowing hydrogen at atmospheric pressure by covering their surfaces with bulk CdTe wafers. At annealing temperatures above 700A degrees C, improvement of crystal quality was confirmed from full-width at half-maximum values of double-crystal rocking-curve measurements and x-ray diffraction measurements. Photoluminescence measurements revealed no deterioration of electrical properties in the annealed n-CdTe layers. Furthermore, annealing at 900A degrees C improved the performance of radiation detectors with structure of p-like CdTe/n-CdTe/n (+)-Si substrate.
引用
收藏
页码:3125 / 3128
页数:4
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