A Review of Thickness Measurements of Thick Transparent Layers Using Optical Interferometry

被引:57
作者
Park, Jungjae [1 ,2 ]
Kim, Jong-Ahn [1 ]
Ahn, Heulbi [2 ]
Bae, Jaeseok [2 ]
Jin, Jonghan [1 ,2 ]
机构
[1] Korea Res Inst Stand & Sci, Div Phys Metrol, 267 Gajeong Ro, Daejeon 34113, South Korea
[2] Korea Univ Sci & Technol, Dept Sci Measurement, 217 Gajeong Ro, Daejeon 34113, South Korea
关键词
Optical interferometry; Thickness measurement; Non-contact measurement; LOW-COHERENCE INTERFEROMETRY; REFRACTIVE-INDEX MEASUREMENT; FILM THICKNESS; PHYSICAL THICKNESS; CORNEAL THICKNESS; SPECTRAL INTERFEROMETRY; GEOMETRICAL THICKNESS; LASER INTERFEROMETER; SURFACE SHAPE; WAFER;
D O I
10.1007/s12541-019-00105-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Thickness is a typical parameter related to length, of which measurements are conducted in various industrial fields, such as the automotive, aviation, ship-building, semiconductor, and display industries. Among various measurement techniques, optical interferometry is very attractive in terms of reliability owing to the direct realization of the metre. Moreover, the nature of this non-contact method is such that it does not damage samples. In this review, optical interferometric methods for measuring thicknesses of thick transparent layers are introduced through a discussion of basic principles and applications. With consideration of optical layouts and analysis methods of interference signals, monochromatic laser interferometry, low-coherence interferometry, and spectral interferometry are introduced and discussed in chapters 2, 3 and 4, respectively. With regard to spectral interferometry, the two different key technologies of spectrally resolved interferometry and wavelength-scanning interferometry are covered in different subsections of chapter 4.
引用
收藏
页码:463 / 477
页数:15
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