Effect of deposition conditions on the stoichiometry and structural properties of LiNbO3 thin films deposited by MOCVD

被引：13

作者：

Margueron, Samuel ^{[1
]}

Bartasyte, Ausrine ^{[2
]}

Plausinaitiene, Valentina ^{[3
]}

Abrutis, Adulfas ^{[3
]}

Boulet, Pascal ^{[2
]}

Kubilius, Virgaudas ^{[3
]}

Saltyte, Zita ^{[3
]}

机构：

[1] Lorraine Univ, EA 4423, LMOPS, 2 Rue E Belin, Metz, France

[2] Lorranine Univ, Inst Jean Lamour, CNRS, UMR 7198, Nancy, France

[3] Vilnius Univ, Vilnius, Lithuania

来源：

OXIDE-BASED MATERIALS AND DEVICES IV | 2013年 / 8626卷

关键词：

LiNbO3; lithium niobate; films; CVD; stoichiometry; residual stresses; twins; CHEMICAL-VAPOR-DEPOSITION; SOLID SOURCE MOCVD; LITHIUM-NIOBATE; EPITAXIAL-GROWTH; SAPPHIRE;

D O I：

10.1117/12.2010105

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Epitaxial LiNbO3 thin films were deposited on C-sapphire substrates by pulsed injection metal organic chemical vapor deposition and atmospheric pressure metal organic chemical vapor deposition. The effect of deposition conditions, such as the ratio of Li/Nb precursors in solution and the deposition pressure, on the phase composition, Li nonstoichiometry, texture, epitaxial quality, residual stresses and formation of twins in LiNbO3 films was studied by means of X-ray diffraction and Raman spectroscopy. It was found that the deposition pressure played an important role in the incorporation of Li2O in the film and the formation of in-plane and out-of-plane twins.

引用

页数：8

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