In-line monitoring of UV photopolymerization with a quartz crystal resonator

被引:7
作者
Choi, HS
Kim, YH [1 ]
Shin, SM
机构
[1] Dong A Univ, Dept Chem Engn, Pusan 604714, South Korea
[2] Korea Inst Geosci & Mineral Resources, Minerals & Mat Proc Div, Taejon 305350, South Korea
关键词
in-line monitoring; photopolymerization; quartz crystal resonator; thin films;
D O I
10.1002/pola.21323
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
An in-line monitoring device using a quartz crystal resonator for thin film polymerization was proposed, and its performance has been evaluated by implementing in the UV polymerization of 2-hydroxyethyl methacrylate with a photoinitiator of 1-chloroanthraquinone. Because the variation of resonant resistance of the resonator is proportional to the square root of viscosity change that is closely related to the polymerization degree, the resistance can be used as a measure of the polymerization degree. The resistance measurements were compared with the outcome of instrumental analyses of polymerization degree using an FTIR spectrometer and a gel permeation chromatograph. The experimental results showed that the resistance measurements were consistent with the experimental outcome of the instrumental analyses, and this indicates the effectiveness of the proposed device. Owing to the simplicity and availability of the resonator system, its wide utilization in the monitoring of a variety of film polymerization processes, including photoresistor application, is expected. (c) 2006 Wiley Periodicals, Inc.
引用
收藏
页码:2428 / 2439
页数:12
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