One-step fabrication of nanostructured NiO films from deep eutectic solvent with enhanced electrochromic performance

Nanostructured NiO thin films were directly prepared by simple and efficient electrodeposition in a choline chloride-based ionic liquid. Uniform granules and some open voids between these granules are observed in the film deposited at 70 degrees C, while the film becomes compact and the NiO particles are 2-6 nm in size when the electrodeposition temperature is 90 degrees C. The optical transmittance of the film increased with the increase of the electrodeposition temperature. Although the electrochromic switching and reaction kinetics of the NiO film deposited at low temperature are fast due to the presence of metallic Ni and some voids, little transmittance modulation occurs in the wavelength range of 300-900 nm. In contrast, the NiO film deposited at high temperature exhibits high optical modulation of 67% at 550 nm, high coloration efficiency (98 cm(2) C-1 at 400 nm, 92 cm(2) C-1 at 550 nm and 51 cm(2) C-1 at 750 nm), good memory effect and cycling durability.