We report that the oxidation of graphene-based highly transparent conductive layers to AlGaN/GaN/AlGaN ultra-violet (UV) light-emitting diodes (LEDs) was suppressed by the use of SiNX passivation layers. Although graphene is considered to be an ideal candidate as the transparent conductive layer to UV-LEDs, oxidation of these layers at high operating temperatures has been an issue. The oxidation is initiated at the un-saturated carbon atoms at the edges of the graphene and reduces the UV light intensity and degrades the current-voltage (I-V) characteristics. The oxidation also can occur at defects, including vacancies. However, GaN-based UV-LEDs deposited with SiNX by plasma-enhanced chemical vapor deposition showed minimal degradation of light output intensity and I-V characteristics because the graphene-based UV transparent conductive layers were shielded from the oxygen molecules. This is a simple and effective approach for maintaining the advantages of graphene conducting layers as electrodes on UV-LEDs. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4733981]
机构:
Max Planck Gesell, Fritz Haber Inst, D-14195 Berlin, GermanyMax Planck Gesell, Fritz Haber Inst, D-14195 Berlin, Germany
Carlsson, Johan M.
;
Hanke, Felix
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Max Planck Gesell, Fritz Haber Inst, D-14195 Berlin, GermanyMax Planck Gesell, Fritz Haber Inst, D-14195 Berlin, Germany
Hanke, Felix
;
Linic, Suljo
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Max Planck Gesell, Fritz Haber Inst, D-14195 Berlin, Germany
Univ Michigan, Dept Chem Engn, Ann Arbor, MI 48109 USAMax Planck Gesell, Fritz Haber Inst, D-14195 Berlin, Germany
Linic, Suljo
;
Scheffler, Matthias
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机构:
Max Planck Gesell, Fritz Haber Inst, D-14195 Berlin, GermanyMax Planck Gesell, Fritz Haber Inst, D-14195 Berlin, Germany
机构:
Max Planck Gesell, Fritz Haber Inst, D-14195 Berlin, GermanyMax Planck Gesell, Fritz Haber Inst, D-14195 Berlin, Germany
Carlsson, Johan M.
;
Hanke, Felix
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机构:
Max Planck Gesell, Fritz Haber Inst, D-14195 Berlin, GermanyMax Planck Gesell, Fritz Haber Inst, D-14195 Berlin, Germany
Hanke, Felix
;
Linic, Suljo
论文数: 0引用数: 0
h-index: 0
机构:
Max Planck Gesell, Fritz Haber Inst, D-14195 Berlin, Germany
Univ Michigan, Dept Chem Engn, Ann Arbor, MI 48109 USAMax Planck Gesell, Fritz Haber Inst, D-14195 Berlin, Germany
Linic, Suljo
;
Scheffler, Matthias
论文数: 0引用数: 0
h-index: 0
机构:
Max Planck Gesell, Fritz Haber Inst, D-14195 Berlin, GermanyMax Planck Gesell, Fritz Haber Inst, D-14195 Berlin, Germany