Direct On-Chip Optical Plasmon Detection with an Atomically Thin Semiconductor

被引:40
作者
Goodfellow, Kenneth M. [1 ]
Chakraborty, Chitraleema [2 ]
Beams, Ryan [1 ]
Novotny, Lukas [3 ]
Vamiyakas, A. Nick [1 ]
机构
[1] Univ Rochester, Inst Opt, Rochester, NY 14627 USA
[2] Univ Rochester, Inst Mat Sci, Rochester, NY 14627 USA
[3] Swiss Fed Inst Technol, Photon Lab, CH-8093 Zurich, Switzerland
基金
美国国家科学基金会; 瑞士国家科学基金会;
关键词
Molybdenum disulfide; silver nanowires; surface plasmon polaritons; nanophotonics; PHOTODETECTORS; PROPAGATION;
D O I
10.1021/acs.nanolett.5b01898
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The determination to develop fast, efficient devices has led to vast studies on photonic circuits but it is difficult to shrink these circuits below the diffraction limit of light. However, the coupling between surface plasmon polaritons and nanostructures in the near-field shows promise in developing next-generation integrated circuitry. In this work, we demonstrate the potential for integrating nanoplasmonic-based light guides with atomically thin materials for on-chip near-field plasmon detection. Specifically, we show near-field electrical detection of silver nanowire plasmons with the atomically thin semiconductor molybdenum disulfide. Unlike graphene, atomically thin semiconductors such as molybdenum disulfide exhibit a bandgap that lends itself for the excitation and detection of plasmons. Our fully integrated plasmon detector exhibits plasmon responsivities of similar to 55 mA/W that corresponds to highly efficient plasmon detection (similar to 0.5 electrons per plasmon).
引用
收藏
页码:5477 / 5481
页数:5
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