Ultimate nanopatterning of Si substrate using filtered liquid metal alloy ion source-focused ion beam

被引：9

作者：

Benkouider, A. ^{[1
]}

Berbezier, I. ^{[1
]}

Ronda, A. ^{[1
]}

Favre, L. ^{[1
]}

Gomes, E. Ruiz ^{[1
]}

Marcus, I. C. ^{[2
]}

Alonso, I. ^{[2
]}

Delobbe, A. ^{[3
]}

Sudraud, P. ^{[3
]}

机构：

[1] Aix Marseille Univ, IM2NP, CNRS, UMR 7334, F-13397 Marseille 20, France

[2] Esfera UAB, Inst Ciencia Mat Barcelona CSIC, Bellaterra 08193, Spain

[3] Orsay Phys, F-13710 Fuveau, France

来源：

THIN SOLID FILMS | 2013年 / 543卷

关键词：

Nanostructures; LMAIS-FIB; Milling; Nanopatterning;

D O I：

10.1016/j.tsf.2013.02.119

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this work we study the influence of the major focused ion beam operating parameters: ion chemical species, beam current, lens voltage and ion dose on the ultimate nanopatterning resolution. We propose a two-step process based on first ion milling of a SiO2 sacrificial layer and second SiO2 chemical etching for the fabrication of nanopatterns with ultimate size/density and ad libitum shape. Examples of resulting patterns are presented. (C) 2013 Elsevier B.V. All rights reserved.

引用

页码：69 / 73

页数：5

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