Plasma source ion implantation: Applications in metal forming

被引:5
作者
Leung, C [1 ]
Elmoursi, A [1 ]
Malaczynski, G [1 ]
Hamdi, A [1 ]
Mantese, J [1 ]
Speck, C [1 ]
机构
[1] GM Corp, Ctr Res & Dev, Elect & Elect Dept, Warren, MI 48090 USA
关键词
D O I
10.1179/026708499101516542
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The use of ion implantation to modify surface properties has always been considered too expensive in the metals industry. However, with the advent of plasma source ion implantation (PSII) the economics can be improved, especially when coupled with the highly desirable propel ties associated with diamond like carbon (DLC) and many carbide and nitride coatings. The rise of PSII to grow DLC films on aluminium alloys, to form hard coatings such as vanadium carbide on forming tools and die casting tools, and to nitrogen implant steel forming tools and chromium plate is reported in this paper. The commercialisation of PSII is the goal of the Advanced Technology Program with over 17 participating members, including national laboratories, corporate research centres, end users, equipment manufacturers, system component suppliers and integrators, and process providers. This multidiscipline cooperation has resulted in more effective research and development of coatings and commercial products, along with easier adaptation of processes and deployment of PSII. (C) 1999 IoM Communications Ltd.
引用
收藏
页码:216 / 220
页数:5
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