Arrays of Arbitrarily Shaped Nanoparticles: Overlay-Errorless Direct Ion Write

被引：19
作者：
Gervinskas, Gediminas [1 ,2 ]
Seniutinas, Gediminas [1 ,2 ]
Rosa, Lorenzo [1 ]
Juodkazis, Saulius [1 ,2 ]
机构：
[1] Swinburne Univ Technol, Ctr Microphoton, Fac Engn & Ind Sci, Hawthorn, Vic 3122, Australia
[2] Swinburne Univ Technol, Australian Natl Fabricat Facil ANFF Victoria Node, Fac Engn & Ind Sci, Hawthorn, Vic 3122, Australia
来源：
ADVANCED OPTICAL MATERIALS | 2013年 / 1卷 / 06期
基金：
澳大利亚研究理事会;
关键词：
BEAM LITHOGRAPHY; SERS SUBSTRATE; ELECTRODES;
D O I：
10.1002/adom.201300027
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A simple solution to lithographically write down to 20-30 nm features over micrometer-sized nanoparticle arrays with high fidelity of pattern transfer from the designed to fabricated architectures is shown. It is achieved via a two-step approach: (i) fabrication of basic shape nanoparticles by electron beam lithography, gold deposition via sputtering and lift-off, then (ii) nano-patterning by focused ion beam lithography. Application potential of 3D tailored nanoparticles for nanotweezers is discussed on the basis of numerical modeling and experimental measurements of extinction.
引用
收藏
页码：456 / 459
页数：4
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