Fabrication of aspherical microlenses in fused silica and silicon

被引:7
|
作者
Voelkel, R [1 ]
Eisner, M [1 ]
Weible, K [1 ]
机构
[1] Karl Suss KG Neuchatel, CH-2007 Neuchatel, Switzerland
来源
LITHOGRAPHIC AND MICROMACHINING TECHNIQUES FOR OPTICAL COMPONENT FABRICATION | 2001年 / 4440卷
关键词
microlens; microlens arrays; refractive micro-optics; fused silica; telecommunication; photolithography;
D O I
10.1117/12.448056
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We report on the fabrication of aspherical refractive microlens arrays on 8 " fused silica and silicon wafers at Suss Neuchatel, Switzerland. Refractive, plano-convex microlenses are fabricated by using photolithography, a reflow or melting resist technique and reactive ion etching. Diffraction-limited optical performance of the microlenses is achieved for refractive microlenses from 100 microns to 1.5 nun diameter and 2 to 50 microns sag. Aspherical lens profiles (aspherical constant from k = -0.5 to -5.2) are obtained by varying the etch parameters during the reactive ion etching transfer. Microlens arrays in fused silica and silicon are fabricated for high-efficient fiber coupling and telecommunication. Densely packed arrays of cylindrical lenses (packing density > 98%, parabolic profile) are fabricated for flattop illumination at UV-wavelengths. Excellent array uniformity of is required for microlenses used within Microlens Projection Lithography systems.
引用
收藏
页码:40 / 43
页数:4
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