Analysis of microstrip lines with diagonal edges using a singularity-enhanced FDTD technique

被引：0

作者：

Foroughipour, M ^{[1
]}

Esselle, KP ^{[1
]}

机构：

[1] Macquarie Univ, Dept Elect, Sydney, NSW 2109, Australia

来源：

MICROWAVE AND OPTICAL TECHNOLOGY LETTERS | 1999年 / 23卷 / 02期

关键词：

singularity; metal edge; FDTD; contour path; subcell;

D O I：

10.1002/(SICI)1098-2760(19991020)23:2<121::AID-MOP17>3.0.CO;2-A

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Microstrip lines not parallel to the FDTD grid are analyzed accurately using singularity-enhanced FDTD equations. It is assumed that the metal strip is infinitely thin, and its edges are diagonal to rite FDTD cell faces. It is found that the enhanced-equations technique models wave propagation accurately, even when the grid is very coarse. (C) 1999 John Wiley & Sons, Inc.

引用

页码：121 / 123

页数：3

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