Comparison of Polished and Dry Etched Semipolar (11(2)over-bar2) III-Nitride Laser Facets

被引:6
作者
Hsu, Po Shan [1 ,2 ]
Farrell, Robert M. [1 ,2 ]
Weaver, Jeremiah J. [1 ,2 ]
Fujito, Kenji [3 ]
DenBaars, Steven P. [1 ,2 ]
Speck, James S. [1 ,2 ]
Nakamura, Shuji [1 ,2 ]
机构
[1] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA
[2] Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA
[3] Mitsubishi Chem Corp, Optoelect Lab, Ibaraki 3001295, Japan
关键词
Facets; GaN; III-nitride; lasers; nonpolar; semipolar;
D O I
10.1109/LPT.2013.2281608
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We compare facet morphology, device characteristics, and far field patterns (FFPs) for semipolar (11 (2) over bar2) laser diodes fabricated with mechanically polished and dry etched mirror facets. Facets formed by Cl-2-based dry etching produced inclined and heavily striated facets. Mechanically polished facets, in contrast, provided vertical and smooth facets (rms roughness = 5.2 nm). The threshold currents of polished facet devices were on average similar to 100 and similar to 200 mA lower than etched facet devices (2x1200 mu m(2) and 4 x 1200 mu m(2) dimension devices, respectively). FFPs from etched facets were also shown to be obscured due to substrate reflections.
引用
收藏
页码:2105 / 2107
页数:3
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