Characterization of Microcrystalline and Amorphous Thin Film Silicon Devices with Raman Spectroscopy

被引:0
|
作者
Hodkiewicz, J. [1 ]
Wall, M. [1 ]
机构
[1] Thermo Fisher Sci, 5225 Verona Rd, Madison, WI 53711 USA
来源
NANOTECHNOLOGY 2011: BIO SENSORS, INSTRUMENTS, MEDICAL, ENVIRONMENT AND ENERGY, NSTI-NANOTECH 2011, VOL 3 | 2011年
关键词
microcrystalline silicon; raman; silicon fraction;
D O I
暂无
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Silicon deposited on glass or silicon carbide is widely used in manufacturing photovoltaic cells. Both the proportion and distribution of amorphous and crystalline silicon are critical for performance and are therefore important to monitor. Raman spectroscopy is an ideal technique for this application, as the two forms generate readily distinguishable spectra that lend themselves to simple quantification methods using Beer's Law. Mapping generates chemical images with detailed information on the spatial distribution of the crystalline and amorphous forms. Since excess excitation laser power can convert amorphous silicon into crystalline silicon, care must be taken to limit the amount of power used. The Thermo Scientific DXR Raman microscope, which is equipped with a laser power regulator, is ideal for this application, particularly if the method has to be replicated from instrument to instrument at multiple manufacturing plants.
引用
收藏
页码:707 / 708
页数:2
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