Enhancement of near-band edge photoluminescence of ZnO film buffered with TiN

被引：9

作者：

Achour, A. ^{[1
]}

Aissa, K. Ait ^{[1
]}

Mbarek, M. ^{[2
]}

El Hadj, K. ^{[1
]}

Ouldhamadouche, N. ^{[3
]}

Barreau, N. ^{[1
]}

Le Brizoual, L. ^{[1
]}

Djouadi, M. A. ^{[1
]}

机构：

[1] Univ Nantes, CNRS, IMN, Inst Mat Jean Rouxel, F-44322 Nantes, France

[2] Univ Monastir, Fac Sci Monastir, Unite Rech Mat Nouveaux & Dispositifs Elect Organ, Monastir 5000, Tunisia

[3] Univ Sci & Technol Houari Boumediene, Lab Phys Mat, Bab Ezzouaur, Algeria

来源：

THIN SOLID FILMS | 2013年 / 538卷

关键词：

TiN; ZnO film; Photoluminescence; RF-sputtering; Buffer layer; THIN-FILMS; OPTICAL-PROPERTIES; PREFERRED ORIENTATION; EPITAXIAL-GROWTH; RAMAN; XPS; TEMPERATURE; SUBSTRATE; SPECTROSCOPY; LAYERS;

D O I：

10.1016/j.tsf.2012.11.117

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

ZnO films were deposited on Si substrate by RF-sputtering using titanium nitride (TiN) as buffer layer that was deposited at different thicknesses: 160 and 2290 nm. Despite the lattice mismatch of up to 6.35% between ZnO and TiN, the ZnO films deposited on TiN buffer layers show enhanced near-band-edge photoluminescence (PL) emission at room temperature which is two times higher of magnitude than those grown directly on Si. The PL enhancement intensity, provided by TiN buffer introduction, is attributed to the improvement of ZnO crystalline quality and stoichiometry. The use of a good electrical conductor which has high thermal stability like TiN as buffer layer for the blue emission enhancement of ZnO would make it promising for optoelectronic applications. (c) 2012 Elsevier B.V. All rights reserved.

引用

页码：71 / 77

页数：7

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