Rapid and Controllable Flame Reduction of TiO2 Nanowires for Enhanced Solar Water-Splitting
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作者:
Cho, In Sun
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Stanford Univ, Dept Mech Engn, Stanford, CA 94305 USAStanford Univ, Dept Mech Engn, Stanford, CA 94305 USA
Cho, In Sun
[1
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Logar, Manca
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Stanford Univ, Dept Mech Engn, Stanford, CA 94305 USA
Jozef Stefan Inst, Adv Mat Dept, Ljubljana 1000, SloveniaStanford Univ, Dept Mech Engn, Stanford, CA 94305 USA
Logar, Manca
[1
,2
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Lee, Chi Hwan
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Stanford Univ, Dept Mech Engn, Stanford, CA 94305 USAStanford Univ, Dept Mech Engn, Stanford, CA 94305 USA
Lee, Chi Hwan
[1
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Cai, Lili
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Stanford Univ, Dept Mech Engn, Stanford, CA 94305 USAStanford Univ, Dept Mech Engn, Stanford, CA 94305 USA
Cai, Lili
[1
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Prinz, Fritz B.
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Stanford Univ, Dept Mech Engn, Stanford, CA 94305 USAStanford Univ, Dept Mech Engn, Stanford, CA 94305 USA
Prinz, Fritz B.
[1
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Zheng, Xiaolin
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Stanford Univ, Dept Mech Engn, Stanford, CA 94305 USAStanford Univ, Dept Mech Engn, Stanford, CA 94305 USA
Zheng, Xiaolin
[1
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机构:
[1] Stanford Univ, Dept Mech Engn, Stanford, CA 94305 USA
[2] Jozef Stefan Inst, Adv Mat Dept, Ljubljana 1000, Slovenia
We report a new flame reduction method to generate controllable amount of oxygen vacancies in TiO2 nanowires that leads to nearly three times improvement in the photoelectrochemical (PEC) water-splitting performance. The flame reduction method has unique advantages of a high temperature (>1000 degrees C), ultrafast heating rate, tunable reduction environment, and open-atmosphere operation, so it enables rapid formation of oxygen vacancies (less than one minute) without damaging the nanowire morphology and crystallinity and is even applicable to various metal oxides. Significantly, we show that flame reduction greatly improves the saturation photocurrent densities of TiO2 nanowires (2.7 times higher), alpha-Fe2O3 nanowires (9.4 times higher), ZnO nanowires (2.0 times higher), and BiVO4 thin film (4.3 times higher) in comparison to untreated control samples for PEC. water-splitting applications.
机构:
Technion Israel Inst Technol, Fac Mat Engn, Haifa, Israel
Ecole Polytech Fed Lausanne, Lab Photon & Interfaces, CH-1015 Lausanne, SwitzerlandTechnion Israel Inst Technol, Fac Mat Engn, Haifa, Israel
Dotan, Hen
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Sivula, Kevin
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Ecole Polytech Fed Lausanne, Lab Photon & Interfaces, CH-1015 Lausanne, SwitzerlandTechnion Israel Inst Technol, Fac Mat Engn, Haifa, Israel
Sivula, Kevin
;
Graetzel, Michael
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Ecole Polytech Fed Lausanne, Lab Photon & Interfaces, CH-1015 Lausanne, SwitzerlandTechnion Israel Inst Technol, Fac Mat Engn, Haifa, Israel
Graetzel, Michael
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Rothschild, Avner
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Technion Israel Inst Technol, Fac Mat Engn, Haifa, IsraelTechnion Israel Inst Technol, Fac Mat Engn, Haifa, Israel
Rothschild, Avner
;
Warren, Scott C.
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Ecole Polytech Fed Lausanne, Lab Photon & Interfaces, CH-1015 Lausanne, SwitzerlandTechnion Israel Inst Technol, Fac Mat Engn, Haifa, Israel
机构:
Technion Israel Inst Technol, Fac Mat Engn, Haifa, Israel
Ecole Polytech Fed Lausanne, Lab Photon & Interfaces, CH-1015 Lausanne, SwitzerlandTechnion Israel Inst Technol, Fac Mat Engn, Haifa, Israel
Dotan, Hen
;
Sivula, Kevin
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h-index: 0
机构:
Ecole Polytech Fed Lausanne, Lab Photon & Interfaces, CH-1015 Lausanne, SwitzerlandTechnion Israel Inst Technol, Fac Mat Engn, Haifa, Israel
Sivula, Kevin
;
Graetzel, Michael
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机构:
Ecole Polytech Fed Lausanne, Lab Photon & Interfaces, CH-1015 Lausanne, SwitzerlandTechnion Israel Inst Technol, Fac Mat Engn, Haifa, Israel
Graetzel, Michael
;
Rothschild, Avner
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机构:
Technion Israel Inst Technol, Fac Mat Engn, Haifa, IsraelTechnion Israel Inst Technol, Fac Mat Engn, Haifa, Israel
Rothschild, Avner
;
Warren, Scott C.
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h-index: 0
机构:
Ecole Polytech Fed Lausanne, Lab Photon & Interfaces, CH-1015 Lausanne, SwitzerlandTechnion Israel Inst Technol, Fac Mat Engn, Haifa, Israel