Conformal dielectric overlayers for engineering dispersion and effective nonlinearity of silicon nanophotonic wires

被引：62

作者：

Liu, Xiaoping ^{[1
]}

Green, William M. J. ^{[2
]}

Chen, Xiaogang ^{[1
]}

Hsieh, I-Wei ^{[1
]}

Dadap, Jerry I. ^{[1
]}

Vlasov, Yurii A. ^{[2
]}

Osgood, Richard M., Jr. ^{[1
]}

机构：

[1] Columbia Univ, Microelect Sci Labs, New York, NY 10027 USA

[2] IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA

来源：

OPTICS LETTERS | 2008年 / 33卷 / 24期

关键词：

D O I：

10.1364/OL.33.002889

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We introduce and study numerically a method for dispersion engineering of Si nanophotonic wires using a thin conformal silicon nitride film deposited around the Si core. Simulations show that this approach may be used to achieve, the dispersion characteristics required for broadband, phase-matched, four-wave mixing processes, while simultaneously maintaining strong modal confinement within the Si core for high effective nonlinearity. (C) 2008 Optical Society of America

引用

页码：2889 / 2891

页数：3

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