AlxTe1-x selector with high ovonic threshold switching performance for memory crossbar arrays

被引:20
作者
Gao, Tian [1 ]
Feng, Jie [1 ]
Ma, Haili [1 ]
Zhu, Xi [1 ]
Ma, Zhixian [1 ]
机构
[1] Shanghai Jiao Tong Univ, Sch Elect Informat & Elect Engn, Minist Educ, Key Lab Thin Film & Microfabricat, Shanghai 200240, Peoples R China
关键词
D O I
10.1063/1.5089818
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report the fabrication of a bidirectional selector based on threshold switching (TS) material AlxTe1-x. By modulating the composition and the thickness of the AlxTe1-x film layer, an optimized bidirectional selector with the advantages of being electroforming-free, with sufficient operating current (1 mA), satisfactory selectivity (ca. 5.9 x 10(3)), appropriately small threshold voltage (ca. +/- 60.7 V), and excellent switching uniformity was fabricated. The trap-limited conduction model was employed to explain the TS characteristics of the W/AlxTe(1-x)/W device. The application of a high electric field to the devices is considered to induce the tunneling of the high-electric field-derived carriers from deep traps to shallow traps, switching the device to the on-state. Published under license by AIP Publishing.
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页数:5
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