Substrate Interaction Effects on Order to Disorder Transition Behavior in Block Copolymer Films

被引:5
作者
Ahn, Hyungju [1 ]
Lee, Yonghoon [1 ]
Lee, Hoyeon [1 ]
Kim, Yoonkeun [1 ]
Ryu, Du Yeol [1 ]
Lee, Byeongdu [2 ]
机构
[1] Yonsei Univ, Dept Chem & Biomol Engn, Seoul 120749, South Korea
[2] Argonne Natl Lab, Adv Photon Source, Xray Sci Div, Argonne, IL 60439 USA
关键词
block copolymers; interfaces; interaction parameter; phase behavior; phase transition; SAXS; thin films; PS-B-PMMA; CONTROLLED INTERFACIAL INTERACTIONS; SURFACE-INDUCED ORIENTATION; SMALL-ANGLE SCATTERING; DIBLOCK COPOLYMER; THIN-FILMS; MICRODOMAIN ORIENTATION; MICROPHASE SEPARATION; MELT; POLYMERS;
D O I
10.1002/polb.23266
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
We present an overview of the recent progress on the phase transition in the block copolymer (BCP) films in terms of the interfacial interactions effects of the substrates and the chi (Flory-Huggins segmental interaction parameter) effects between the two blocks. For the BCP films thinner than a critical thickness (L-c) above which the transition is independent of film thickness, the order-to-disorder transition (ODT) increased or decreased with decreasing film thickness depending on the interfacial interaction types. The rapid and slow changes in the ODT were attributed to the relative magnitude of enthalpic contribution to chi between two blocks. Interestingly, a periodic amplification in the block composition for the BCP films suppressed the compositional fluctuation in the film geometry, resulting in the ODT shifts from the bulk ODTs above L-c. This effect of the BCP films was more illustrated by the ODT shift effects depending on the strength of the preferential interactions on the substrates. (C) 2013 Wiley Periodicals, Inc. J. Polym. Sci., Part B: Polym. Phys. 2013, 51, 567-573
引用
收藏
页码:567 / 573
页数:7
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