A strong ionization model in plasma physics

被引：4

作者：

Choquet, Isabelle ^{[2
]}

Degond, Pierre ^{[3
]}

Lucquin-Desreux, Brigitte ^{[1
]}

机构：

[1] Univ Paris 06, CNRS UMR 7598, Lab Jacques Louis Lions, F-75252 Paris 05, France

[2] Univ West, Dept Technol Math & Comp Sci, S-46139 Trollhattan, Sweden

[3] Univ Toulouse 3, Math Ind & Phys UMR 5640, CNRS, F-31062 Toulouse 4, France

来源：

MATHEMATICAL AND COMPUTER MODELLING | 2009年 / 49卷 / 1-2期

关键词：

Fluid limit for partially ionized plasmas; Glow discharge interacting with an ion beam; Strong ionization model; Inelastic collisions; Saha plasma; Diffusion limit; HIERARCHY; DIFFUSION;

D O I：

10.1016/j.mcm.2007.06.035

中图分类号：

TP39 [计算机的应用];

学科分类号：

081203 ; 0835 ;

摘要：

We derive a fluid model for partially ionized plasmas in which the dominant collisional process is not only driven by elastic collisions against neutrals, but also by ionization/recombination processes, especially concerning the electrons. In terms of applications, these models correspond to the interaction of a glow discharge with an ion beam. Crown Copyright (C) 2008 Published by Elsevier Ltd. All rights reserved.

引用

页码：88 / 113

页数：26

共 13 条

[1] On a hierarchy of macroscopic models for semiconductors [J].