Ferroelectricity in Si-Doped Hafnia: Probing Challenges in Absence of Screening Charges

被引:18
作者
Celano, Umberto [1 ]
Gomez, Andres [2 ]
Piedimonte, Paola [1 ,5 ]
Neumayer, Sabine [3 ]
Collins, Liam [3 ]
Popovici, Mihaela [1 ]
Florent, Karine [1 ,6 ]
McMitchell, Sean R. C. [1 ]
Favia, Paola [1 ]
Drijbooms, Chris [1 ]
Bender, Hugo [1 ]
Paredis, Kristof [1 ]
Di Piazza, Luca [1 ]
Jesse, Stephen [3 ]
Van Houdt, Jan [1 ,4 ]
van der Heide, Paul [1 ]
机构
[1] IMEC, Kapeldreef 75, B-3001 Leuv Leuven, Belgium
[2] Inst Ciencia Mat Barcelona ICMAB CSIC, Campus UAB, Bellaterra 08193, Catalonia, Spain
[3] Oak Ridge Natl Lab, Ctr Nanophase Mat Sci, 1 Bethel Valley Rd, Oak Ridge, TN 37830 USA
[4] Katholieke Univ Leuven, Dept Elect Engn ESAT, Kasteelpk Arenberg 1, B-3001 Leuven, Belgium
[5] Politecn Milan, Dept Elect Informat & Bioengn DEIB, Piazza Leonardo da Vinci 32, I-20133 Milan, Italy
[6] Micron Technol Inc, 8000 S Fed Way, Boise, ID 83707 USA
基金
欧盟地平线“2020”;
关键词
HfO2-based ferroelectrics; Si-doped HfO2; binary oxide ferroelectrics; atomic force microscopy; band-excitation piezoresponse force microscopy; OXIDE; INSIGHTS; RRAM;
D O I
10.3390/nano10081576
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The ability to develop ferroelectric materials using binary oxides is critical to enable novel low-power, high-density non-volatile memory and fast switching logic. The discovery of ferroelectricity in hafnia-based thin films, has focused the hopes of the community on this class of materials to overcome the existing problems of perovskite-based integrated ferroelectrics. However, both the control of ferroelectricity in doped-HfO(2)and the direct characterization at the nanoscale of ferroelectric phenomena, are increasingly difficult to achieve. The main limitations are imposed by the inherent intertwining of ferroelectric and dielectric properties, the role of strain, interfaces and electric field-mediated phase, and polarization changes. In this work, using Si-doped HfO(2)as a material system, we performed a correlative study with four scanning probe techniques for the local sensing of intrinsic ferroelectricity on the oxide surface. Putting each technique in perspective, we demonstrated that different origins of spatially resolved contrast can be obtained, thus highlighting possible crosstalk not originated by a genuine ferroelectric response. By leveraging the strength of each method, we showed how intrinsic processes in ultrathin dielectrics, i.e., electronic leakage, existence and generation of energy states, charge trapping (de-trapping) phenomena, and electrochemical effects, can influence the sensed response. We then proceeded to initiate hysteresis loops by means of tip-induced spectroscopic cycling (i.e., "wake-up"), thus observing the onset of oxide degradation processes associated with this step. Finally, direct piezoelectric effects were studied using the high pressure resulting from the probe's confinement, noticing the absence of a net time-invariant piezo-generated charge. Our results are critical in providing a general framework of interpretation for multiple nanoscale processes impacting ferroelectricity in doped-hafnia and strategies for sensing it.
引用
收藏
页码:1 / 15
页数:15
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