Graphene Growth and Carbon Diffusion Process during Vacuum Heating on Cu(111)/Al2O3 Substrates

被引：21

作者：

Ogawa, Shuichi ^{[1
]}

Yamada, Takatoshi ^{[2
]}

Ishidzuka, Shinji ^{[3
]}

Yoshigoe, Akitaka ^{[4
]}

Hasegawa, Masataka ^{[2
]}

Teraoka, Yuden ^{[4
]}

Takakuwa, Yuji ^{[1
]}

机构：

[1] Tohoku Univ, Inst Multidisciplinary Res Adv Mat, Sendai, Miyagi 9808577, Japan

[2] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki 3058568, Japan

[3] Nagaoka Univ Technol, Nagaoka, Niigata 9402188, Japan

[4] Japan Atom Energy Agcy, Sayo, Hyogo 6795198, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2013年 / 52卷 / 11期

关键词：

X-RAY PHOTOELECTRON; SURFACE-CHEMISTRY; OXIDATION; SPECTROSCOPY; OXIDE; PHOTOEMISSION; NICKEL; COPPER; CU;

D O I：

10.7567/JJAP.52.110122

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In this study, the behavior of carbon atoms in the annealing/cooling process of graphene/Cu(111) substrates is investigated using photoelectron spectroscopy and secondary ion mass spectroscopy. After the growth of graphene on Cu(111) surfaces, Cu2O was formed at the graphene/Cu interface during transportation through air atmosphere. The Cu2O layer completely disappeared by vacuum annealing at 500 degrees C. Graphene was decomposed and carbon atoms diffused into the Cu substrate by further elevation of annealing temperature to 950 degrees C. When the sample was cooled down, the carbon atoms did not segregate on the surface and remained in the Cu substrate. This result indicates the carbon atoms easily diffuse into Cu substrates in vacuum annealing while the amount of diffused carbon atoms in the thermal chemical vapor deposition (CVD) process is smaller, suggesting that the barrier layer, which prevents the diffusion of C atoms, exists on Cu surfaces in the graphene CVD growth. (C) 2013 The Japan Society of Applied Physics

引用

页数：8

共 37 条

[1] Photoelectron spectroscopy of hydrogen at the polycrystalline diamond surface [J].

Ballutaud, D. ;

Simon, N. ;

Girard, H. ;

Rzepka, E. ;

Bouchet-Fabre, B. .

[2] Role of Kinetic Factors in Chemical Vapor Deposition Synthesis of Uniform Large Area Graphene Using Copper Catalyst [J].

Bhaviripudi, Sreekar ;

Jia, Xiaoting ;

Dresselhaus, Mildred S. ;

Kong, Jing .

NANO LETTERS, 2010, 10 (10) :4128-4133

[3] Photoemission study of onionlike carbons produced by annealing nanodiamonds [J].

Butenko, YV ;

Krishnamurthy, S ;

Chakraborty, AK ;

Klznetsov, VL ;

Dhanak, VR ;

Hunt, MRC ;

Siller, L .

PHYSICAL REVIEW B, 2005, 71 (07)

[4] Surface chemistry of Cu in the presence of CO2 and H2O [J].

Deng, Xingyi ;

Verdaguer, Albert ;

Herranz, Tirma ;

Weis, Christoph ;

Bluhm, Hendrik ;

Salmeron, Miquel .

LANGMUIR, 2008, 24 (17) :9474-9478

[5] MANY-ELECTRON SINGULARITY IN X-RAY PHOTOEMISSION AND X-RAY LINE SPECTRA FROM METALS [J].

DONIACH, S ;

SUNJIC, M .

JOURNAL OF PHYSICS PART C SOLID STATE PHYSICS, 1970, 3 (02) :285-&

[6]

EIZENBERG M, 1979, SURF SCI, V82, P228, DOI 10.1016/0039-6028(79)90330-3

[7] Deoxidization of Cu oxide under extremely low oxygen pressure ambient [J].

Endo, K ;

Shirakawa, N ;

Yoshida, Y ;

Ikeda, S ;

Mino, T ;

Gofuku, E ;

Suzuki, E .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2006, 45 (12-16) :L393-L395

[8] SURFACE PRECIPITATION OF GRAPHITE LAYERS ON CARBON-DOPED NICKEL AND THEIR STABILIZATION EFFECT AGAINST CHEMISORPTION AND INITIAL OXIDATION [J].

FUJITA, D ;

HOMMA, T .

SURFACE AND INTERFACE ANALYSIS, 1992, 19 (1-12) :430-434

[9] XPS STUDY OF THE SURFACE ENRICHMENT PROCESS OF CARBON ON C-DOPED NI(111) USING INELASTIC BACKGROUND ANALYSIS [J].

FUJITA, D ;

SCHLEBERGER, M ;

TOUGAARD, S .

SURFACE SCIENCE, 1995, 331 :343-348

[10] Probing the Thermal Deoxygenation of Graphene Oxide Using High-Resolution In Situ X-ray-Based Spectroscopies [J].

Ganguly, Abhijit ;

Sharma, Surbhi ;

Papakonstantinou, Pagona ;

Hamilton, Jeremy .

JOURNAL OF PHYSICAL CHEMISTRY C, 2011, 115 (34) :17009-17019

← 1 2 3 4 →