Semiconducting properties of passive films formed on electroplated Ni and Ni-Co alloys

被引:59
作者
Kang, Jianqiang [1 ]
Yang, Yifu [1 ]
Jiang, Xi [1 ]
Shao, Huixia [1 ]
机构
[1] Wuhan Univ, Dept Chem, Wuhan 430072, Peoples R China
关键词
Nickel; Cobalt; Alloy; Alkaline corrosion; Passive films;
D O I
10.1016/j.corsci.2008.09.005
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The semiconducting properties of the passive films on electroplated Ni and Ni-Co alloys were investigated using Mott-Schottky analysis. The cyclic voltammetry (CV) behaviors of Ni indicate that the film thickness will not increase unless the applied potential is higher than 0.504 V (vs. HgO/Hg). The passivity samples treated with CV reveal their behaviors are that of a p-type semiconductor. The three semiconductive parameters, the acceptor density (N-A), the flatband potential (E-fb) and the thickness of the space charge layer (L-sc) were calculated from the Mott-Schottky plots, respectively. The relationship between the parameters and the protective characters against corrosion was analyzed. (C) 2008 Elsevier Ltd. All rights reserved.
引用
收藏
页码:3576 / 3580
页数:5
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