Investigation of Mg2(Si,Sn) thin films for integrated thermoelectric devices

被引:15
|
作者
Prahoveanu, Codrin [1 ,2 ,3 ]
Lacoste, Ana [1 ,2 ]
Bechu, Stephane [1 ,2 ]
de Vaulx, Cedric [4 ]
Azzouz, Kamel [4 ]
Laversenne, Laetitia [2 ,3 ,5 ]
机构
[1] Univ Grenoble Alpes, LPSC, CNRS, IN2P3, F-38026 Grenoble, France
[2] Univ Grenoble Alpes, F-38000 Grenoble, France
[3] CNRS, Inst NEEL, F-38000 Grenoble, France
[4] Valeo Thermal Syst, F-78321 Le Mesnil St Denis, France
[5] Harvard Univ, Sch Engn & Appl Sci, Cambridge, MA 02138 USA
关键词
Thermoelectric materials; Mg-2(Si; Sn); Thin films; Microwave plasma co-sputtering; Thermal stability; Film-substrate reactivity; MG2SI; ENHANCEMENT;
D O I
10.1016/j.jallcom.2015.07.043
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The ongoing miniaturization of thermoelectric (TE) modules requires scaling down to thin films of TE materials with high efficiency. Moreover, thin film-based integrated devices contain interfaces (between TE materials and dielectric or conductive components) that must show chemical and mechanical stability in the whole range of the operating temperature. In search for such materials, thin films of Mg-2(Si,Sn) solid solutions have been deposited by microwave plasma-assisted co-sputtering method with a fine control over their composition. Three types of substrates were chosen (SiO2/Si, glass and Ni substrates) to examine their potential use as insulators and electrodes in a miniaturized thermoelectric module based on Mg-2(Si,Sn). The electrical conductivity and thermo-mechanical properties, as well as the thermal stability, of the thin films have been investigated in the intermediate range of temperature (300-700 K). It is shown that the deposition process, as well as the substrates on which the films are grown, determine the subsequent adherence of the films. Also, the metastability of the Mg2Si0.4Sn0.6 solid solution for small variations in composition (possibly bordering the edge of the miscibility gap in the phase diagram) has been observed, which can lead to a separation into 2 phases during the first annealing treatment at intermediate temperatures. (C) 2015 Published by Elsevier B.V.
引用
收藏
页码:573 / 578
页数:6
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