共 50 条
[21]
Nitride and oxide etching in CHF3/CF4/He plasma: Loading effects and selectivity
[J].
PROCEEDINGS OF THE ELEVENTH INTERNATIONAL SYMPOSIUM ON PLASMA PROCESSING,
1996, 96 (12)
:505-514
[24]
A Comparison of CF4, CHF3 and C4F8 + Ar/O2 Inductively Coupled Plasmas for Dry Etching Applications
[J].
Plasma Chemistry and Plasma Processing,
2021, 41
:1671-1689
[25]
CF and CF2 radical densities in 13.56-Mhz CHF3/Ar inductively coupled plasma
[J].
Nakagawa, H. (nakagawa@krl.mee.met.co.jp),
1600, Japan Society of Applied Physics (41)
[30]
CF and CF2 radical densities in 13.56-MHz CHF3/Ar inductively coupled plasma
[J].
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS,
2002, 41 (01)
:319-325