Effect of O2 plasma pretreatment on structural and optical properties of ZnO films on PES substrate by atomic layer deposition

被引：12

作者：

Heo, Joo Hoe ^{[1
]}

Ryu, Hyukhyun ^{[1
]}

Lee, Won-Jae ^{[2
]}

机构：

[1] Inje Univ, Ctr Nano Mfg, Dept Nano Syst Engn, Gimhae 621749, Gyeongnam, South Korea

[2] Dong Eui Univ, Dept Mat & Components Engn, Pusan 614714, South Korea

来源：

JOURNAL OF INDUSTRIAL AND ENGINEERING CHEMISTRY | 2013年 / 19卷 / 05期

关键词：

Zinc oxide (ZnO); Polymer substrate; Atomic layer deposition (ALD); Plasma treatment; BUFFER LAYER; ANNEALING TEMPERATURE; GRAIN-SIZE; GROWTH; SAPPHIRE;

D O I：

10.1016/j.jiec.2013.02.001

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

ZnO films were deposited on the O-2 plasma treated polyethersulfone (PES) substrates by atomic layer deposition. X-ray diffraction (XRD) measurements reveals that the grains in ZnO films show strongly (0 0 2) preferential orientation, when the duration of plasma pretreatment increases. The decreased grain size and improved crystallinity results in the decreased surface roughness of ZnO films. In contrast, when the duration of plasma pretreatment increases to 60 mm, the surface roughness increases again due to the increased grain size and worse crystallinity. In photoluminescence measurement, slight blue shift of near-band-edge emission occurs with increasing duration of plasma pretreatment up to 30 min. (C) 2013 The Korean Society of Industrial and Engineering Chemistry. Published by Elsevier B.V. All rights reserved.

引用

页码：1638 / 1641

页数：4

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