Optical, structural and electrical properties of tin oxide films prepared by magnetron sputtering

被引：22

作者：

Karapatnitski, IA ^{[1
]}

Mit', KA ^{[1
]}

Mukhamedshina, DM ^{[1
]}

Beisenkhanov, NB ^{[1
]}

机构：

[1] Minist Educ & Sci, Inst Phys & Technol, Alma Ata 480082, Kazakhstan

来源：

SURFACE & COATINGS TECHNOLOGY | 2002年 / 151卷

关键词：

tin oxide thin film; structure;

D O I：

10.1016/S0257-8972(01)01611-5

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Films with thickness of 150-450 nm were deposited at a rate of 0.5 Angstrom/s in an argon-oxygen atmosphere on polycrystalline corundum, quartz and glass slides. The films were annealed in air at temperature 550 degreesC for 0.5, 1, 2, 4 and 8 h to stabilize their parameters. A correlation between the electrical resistivity and optical and structural properties of the films was found. Transparent films for wavelengths in the range 200-1200 nm as well as as-sensitive films for sensors were obtained. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：76 / 81

页数：6

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