Preparation of WO3 Thin Film by Successive Dip Coating for Electrochromic and Photoelectrochromic Devices

被引：6

作者：

Park, Jae-Hyuk ^{[1
,2
]}

Kang, Jin Soo ^{[1
,2
]}

Cha, In Young ^{[3
]}

Kim, Jin ^{[1
,2
]}

Lee, Kyung Jae ^{[1
,2
]}

Sung, Yung-Eun ^{[1
,2
]}

机构：

[1] Inst for Basic Sci Korea, Ctr Nanoparticle Res, Seoul 151742, South Korea

[2] Seoul Natl Univ, Sch Chem & Biol Engn, Seoul 151742, South Korea

[3] Korea Inst Sci & Technol, Fuel Cell Res Ctr, Seoul 136791, South Korea

来源：

BULLETIN OF THE KOREAN CHEMICAL SOCIETY | 2015年 / 36卷 / 09期

关键词：

Electrochromic device; Photoelectrochromic device; Tungsten oxide; Successive dip coating; TUNGSTEN-OXIDE FILMS; TECHNOLOGY; WINDOWS;

D O I：

10.1002/bkcs.10424

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Here we report the superiority of WO3 thin films prepared by successive dip coating in electrochromic devices. Dip coatings were done on transparent conducting oxide substrates in theWO3 precursor solution a number of times without drying in between the coating steps. This process enabled the fabrication of WO3 films with optimum thickness and large roughness, which led to enhanced performance when they were employed as the electrode in electrochromic devices. We made a further observation by applying these electrodes in photoelectrochromic devices and verified the excellent properties of the successively dip-coated WO3 films.

引用

页码：2213 / 2220

页数：8

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