Transparent Conductivep-Type Cuprous Oxide Films in Vis-NIR Region Prepared by Ion-Beam Assisted DC Reactive Sputtering

Cu2O thin film has been widely studied due to its intrinsicp-type conductivity. It can be used asp-type transparent conductive electrode or hole transport layer in various potential applications. However, its intrinsicp-type conductivity is very limited, which needs to be optimized by introducing acceptor defects. In this work, the electrical properties of the Cu2O films was improved through introducing interstitial oxygen in the films those were deposited via direct current sputtering assisted by oxygen ion beam. The results show that with oxygen ion beam current increase, the carrier concentration effectively improves. However, with more interstitial oxygen introduced, the film's crystallinity significantly reduces, as well as the carrier mobility decreases. Meanwhile, all of the Cu2O films present moderate transmittance in the visible region (400-800 nm), but ideal transmittance in the near infrared (NIR) light region (800-2500 nm). When compared with the strong reflection of then-type transparent conductive film to the near infrared light, the Cu2O film is transparent conductive in NIR region, which expands its application in the fabrication of NIR electrical devices.