Particles as probes for complex plasmas in front of biased surfaces

被引:39
作者
Basner, R. [1 ]
Sigeneger, F. [1 ]
Loffhagen, D. [1 ]
Schubert, G. [2 ]
Fehske, H. [2 ]
Kersten, H. [3 ]
机构
[1] Leibniz Inst Plasma Res & Technol, Greifswald, Germany
[2] Ernst Moritz Arndt Univ Greifswald, Inst Phys, Greifswald, Germany
[3] Univ Kiel, Inst Expt & Appl Phys, D-24098 Kiel, Germany
关键词
MICRO-DISPERSE PARTICLES; FALLING DUST PARTICLES; RF PLASMA; ION DRAG; MICROPARTICLES; MANIPULATION; ELECTRODE; GRAINS; CHARGE; ARGON;
D O I
10.1088/1367-2630/11/1/013041
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
An interesting aspect in the research of complex (dusty) plasmas is the experimental study of the interaction of micro-particles with the surrounding plasma for diagnostic purposes. Local electric fields can be determined from the behaviour of particles in the plasma, e. g. particles may serve as electrostatic probes. Since in many cases of applications in plasma technology it is of great interest to describe the electric field conditions in front of floating or biased surfaces, the confinement and behaviour of test particles is studied in front of floating walls inserted into a plasma as well as in front of additionally biased surfaces. For the latter case, the behaviour of particles in front of an adaptive electrode, which allows for an efficient confinement and manipulation of the grains, has been experimentally studied in terms of the dependence on the discharge parameters and on different bias conditions of the electrode. The effect of the partially biased surface (dc and rf) on the charged micro-particles has been investigated by particle falling experiments. In addition to the experiments, we also investigate the particle behaviour numerically by molecular dynamics, in combination with a fluid and particle-in-cell description of the plasma.
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页数:24
相关论文
共 57 条
[21]   Charging of micro-particles in plasma-dust interaction [J].
Kersten, H ;
Deutsch, H ;
Kroesen, GMW .
INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 2004, 233 (1-3) :51-60
[22]   Energy influx from an rf plasma to a substrate during plasma processing [J].
Kersten, H ;
Stoffels, E ;
Stoffels, WW ;
Otte, M ;
Csambal, C ;
Deutsch, H ;
Hippler, R .
JOURNAL OF APPLIED PHYSICS, 2000, 87 (08) :3637-3645
[23]   The plasma-sheath boundary near the adaptive electrode as traced by particles [J].
Annaratone, BM ;
Glier, M ;
Stuffler, T ;
Raif, M ;
Thomas, HM ;
Morfill, GE .
NEW JOURNAL OF PHYSICS, 2003, 5 :92.1-92.12
[24]  
Kersten H, 2001, CONTRIB PLASM PHYS, V41, P598, DOI 10.1002/1521-3986(200111)41:6<598::AID-CTPP598>3.0.CO
[25]  
2-Z
[26]   Finite size effects on charging in dusty plasmas [J].
Matyash, K. ;
Schneider, R. .
JOURNAL OF PLASMA PHYSICS, 2006, 72 (809-812) :809-812
[27]   Rotating dust ring in an RF discharge coupled with a dc-magnetron sputter source.: Experiment and simulation [J].
Matyash, K ;
Fröhlich, M ;
Kersten, H ;
Thieme, G ;
Schneider, R ;
Hannemann, M ;
Hippler, R .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2004, 37 (19) :2703-2708
[28]   Laser-excited Mach cones in a dusty plasma crystal [J].
Melzer, A ;
Nunomura, S ;
Samsonov, D ;
Ma, ZW ;
Goree, J .
PHYSICAL REVIEW E, 2000, 62 (03) :4162-4176
[29]   Structure and stability of the plasma crystal [J].
Melzer, A ;
Schweiger, VA ;
Schweigert, IV ;
Homann, A ;
Peters, S ;
Piel, A .
PHYSICAL REVIEW E, 1996, 54 (01) :R46-R49
[30]  
Morfill G., 2003, NEW J PHYS, V5