Measurement of stress in a synthetic diamond substrate using the photoelastic method

被引：2
|
作者：
Liang, HC [1 ]
Vescan, A [1 ]
Kohn, E [1 ]
Chin, KK [1 ]
机构：
[1] UNIV ULM,DEPT ELECTRON DEVICES & CIRCUITS,D-89069 ULM,GERMANY
来源：
DIAMOND AND RELATED MATERIALS | 1996年 / 5卷 / 6-8期
关键词：
diamond; photoelasticity; stress; measurement;
D O I：
10.1016/0925-9635(95)00455-6
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The residual stress in a synthetic diamond substrate was analyzed using an automatic data acquisition and analysis system based on photoelastic principles. Digital image processing techniques were applied to improve the quality of the sensed images, to reduce noise and to determine the boundary of the measured samples. Methods were also introduced to calculate the birefringence phase difference and principal stress directions. The shearing stress difference method was applied to calculate the two-dimensional stress distribution.
引用
收藏
页码：664 / 668
页数：5
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