共 53 条
Fabrication of robust self-cleaning superhydrophobic coating by deposition of polymer layer on candle soot surface
被引:45
作者:

Sutar, Rajaram S.
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机构:
Raje Ramrao Coll, Dept Phys, Self Cleaning Res Lab, Jath 416404, Maharshtra, India
Shivaji Univ, Kolhapur, Maharashtra, India Raje Ramrao Coll, Dept Phys, Self Cleaning Res Lab, Jath 416404, Maharshtra, India

Latthe, Sanjay S.
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h-index: 0
机构:
Raje Ramrao Coll, Dept Phys, Self Cleaning Res Lab, Jath 416404, Maharshtra, India
Shivaji Univ, Kolhapur, Maharashtra, India Raje Ramrao Coll, Dept Phys, Self Cleaning Res Lab, Jath 416404, Maharshtra, India

Nagappan, Saravanan
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Pusan Natl Univ, Dept Polymer Sci & Engn, Busan, South Korea Raje Ramrao Coll, Dept Phys, Self Cleaning Res Lab, Jath 416404, Maharshtra, India

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Sadasivuni, Kishor Kumar
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Qatar Univ, Ctr Adv Mat, Doha, Qatar Raje Ramrao Coll, Dept Phys, Self Cleaning Res Lab, Jath 416404, Maharshtra, India

Liu, Shanhu
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h-index: 0
机构:
Henan Univ, Henan Joint Int Res Lab Environm Pollut Control M, Henan Key Lab Polyoxometalate Chem, Coll Chem & Chem Engn, Kaifeng 475004, Peoples R China Raje Ramrao Coll, Dept Phys, Self Cleaning Res Lab, Jath 416404, Maharshtra, India

Xing, Ruimin
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h-index: 0
机构:
Henan Univ, Henan Joint Int Res Lab Environm Pollut Control M, Henan Key Lab Polyoxometalate Chem, Coll Chem & Chem Engn, Kaifeng 475004, Peoples R China Raje Ramrao Coll, Dept Phys, Self Cleaning Res Lab, Jath 416404, Maharshtra, India

Bhosale, Appasaheb K.
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h-index: 0
机构:
Raje Ramrao Coll, Dept Phys, Self Cleaning Res Lab, Jath 416404, Maharshtra, India
Shivaji Univ, Kolhapur, Maharashtra, India Raje Ramrao Coll, Dept Phys, Self Cleaning Res Lab, Jath 416404, Maharshtra, India
机构:
[1] Raje Ramrao Coll, Dept Phys, Self Cleaning Res Lab, Jath 416404, Maharshtra, India
[2] Shivaji Univ, Kolhapur, Maharashtra, India
[3] Pusan Natl Univ, Dept Polymer Sci & Engn, Busan, South Korea
[4] Qatar Univ, Ctr Adv Mat, Doha, Qatar
[5] Henan Univ, Henan Joint Int Res Lab Environm Pollut Control M, Henan Key Lab Polyoxometalate Chem, Coll Chem & Chem Engn, Kaifeng 475004, Peoples R China
基金:
中国国家自然科学基金;
关键词:
Candle Soot;
Lotus leaf;
Polypropylene;
Self-Cleaning;
Superhydrophobic;
COMPOSITE COATINGS;
NANOCOMPOSITE;
TRANSPARENT;
WETTABILITY;
RESISTANCE;
PARTICLES;
TEMPLATE;
PAPER;
D O I:
10.1002/app.49943
中图分类号:
O63 [高分子化学(高聚物)];
学科分类号:
070305 ;
080501 ;
081704 ;
摘要:
A facile and inexpensive way have been developed to fabricate robust self-cleaning superhydrophobic coating by depositing polymer layer on candle soot (CS) surface using dip coating method. The stability and robustness of the CS deposited superhydrophobic surface is much weaker due to weak interaction and nonchemical bonding with the substrate. We introduced a thin layer of polystyrene, polyethylene, polypropylene (PP), and polyvinylidene fluoride on CS surface in order to improve its mechanical properties. The fabricated surfaces with the use of respective polymers exhibited water contact angles of nearly 170, 174, 175, and 171 degrees with sliding angles of 2, 1, 1, and 3 degrees, respectively. Although, all the polymers used in this work exhibited excellent superhydrophobic and self-cleaning surface property, we found that the PP deposited CS surface exhibit better stability against water jet hitting and water drop impact tests. The PP deposited CS surface almost maintained their surface properties even after 50 cycles of sandpaper abrasion and 20 cycles of adhesive tape peeling tests. The mechanical durability tests confirmed that PP is a better polymer to improve the long-term durability of CS surface. Therefore, this simple, time saving, and inexpensive method for fabricating superhydrophobic coating can be used for potential industrial application.
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Tokyo Univ Sci, Photocatalysis Int Res Ctr, Res Inst Sci & Technol, Noda, Chiba 2788510, Japan Tokyo Univ Sci, Photocatalysis Int Res Ctr, Res Inst Sci & Technol, Noda, Chiba 2788510, Japan

Ravidhas, C.
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Bishop Heber Coll, Dept Phys, Tiruchirappalli 17, Tamil Nadu, India Tokyo Univ Sci, Photocatalysis Int Res Ctr, Res Inst Sci & Technol, Noda, Chiba 2788510, Japan

Christy, A. Jennifer
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Bishop Heber Coll, Dept Phys, Tiruchirappalli 17, Tamil Nadu, India Tokyo Univ Sci, Photocatalysis Int Res Ctr, Res Inst Sci & Technol, Noda, Chiba 2788510, Japan

Kirubakaran, D. David
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Bishop Heber Coll, Dept Phys, Tiruchirappalli 17, Tamil Nadu, India Tokyo Univ Sci, Photocatalysis Int Res Ctr, Res Inst Sci & Technol, Noda, Chiba 2788510, Japan

Venkatesh, R.
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Bishop Heber Coll, Dept Phys, Tiruchirappalli 17, Tamil Nadu, India Tokyo Univ Sci, Photocatalysis Int Res Ctr, Res Inst Sci & Technol, Noda, Chiba 2788510, Japan

Devadoss, Anitha
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Tokyo Univ Sci, Photocatalysis Int Res Ctr, Res Inst Sci & Technol, Noda, Chiba 2788510, Japan Tokyo Univ Sci, Photocatalysis Int Res Ctr, Res Inst Sci & Technol, Noda, Chiba 2788510, Japan

Terashima, C.
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Tokyo Univ Sci, Photocatalysis Int Res Ctr, Res Inst Sci & Technol, Noda, Chiba 2788510, Japan
ACT C JST, Tokyo, Japan Tokyo Univ Sci, Photocatalysis Int Res Ctr, Res Inst Sci & Technol, Noda, Chiba 2788510, Japan

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Fujishima, Akira
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Tokyo Univ Sci, Photocatalysis Int Res Ctr, Res Inst Sci & Technol, Noda, Chiba 2788510, Japan
ACT C JST, Tokyo, Japan Tokyo Univ Sci, Photocatalysis Int Res Ctr, Res Inst Sci & Technol, Noda, Chiba 2788510, Japan
[20]
Development of sol-gel processed semi-transparent and self-cleaning superhydrophobic coatings
[J].
Latthe, Sanjay S.
;
Terashima, Chiaki
;
Nakata, Kazuya
;
Sakai, Munetoshi
;
Fujishima, Akira
.
JOURNAL OF MATERIALS CHEMISTRY A,
2014, 2 (15)
:5548-5553

Latthe, Sanjay S.
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Tokyo Univ Sci, Res Inst Sci & Technol, Photocatalysis Int Res Ctr, Noda, Chiba 2788510, Japan Tokyo Univ Sci, Res Inst Sci & Technol, Photocatalysis Int Res Ctr, Noda, Chiba 2788510, Japan

Terashima, Chiaki
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Tokyo Univ Sci, Res Inst Sci & Technol, Photocatalysis Int Res Ctr, Noda, Chiba 2788510, Japan Tokyo Univ Sci, Res Inst Sci & Technol, Photocatalysis Int Res Ctr, Noda, Chiba 2788510, Japan

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Sakai, Munetoshi
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Kanagawa Acad Sci & Technol, Photocatalyst Grp, Takatsu Ku, Kawasaki, Kanagawa 2130012, Japan Tokyo Univ Sci, Res Inst Sci & Technol, Photocatalysis Int Res Ctr, Noda, Chiba 2788510, Japan

Fujishima, Akira
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Tokyo Univ Sci, Res Inst Sci & Technol, Photocatalysis Int Res Ctr, Noda, Chiba 2788510, Japan Tokyo Univ Sci, Res Inst Sci & Technol, Photocatalysis Int Res Ctr, Noda, Chiba 2788510, Japan