Bond formation in ion beam synthesised amorphous gallium nitride

被引:12
作者
Almeida, SA
Silva, SRP [1 ]
Sealy, BJ
Watts, JF
机构
[1] Univ Surrey, Sch Mech & Mat Engn, Guildford GU2 5XH, Surrey, England
[2] Univ Surrey, Sch Elect Engn Informat Technol & Math, Guildford GU2 5XH, Surrey, England
关键词
amorphous materials; infrared spectroscopy; Fourier transform infrared spectroscopy (FTIR); X-ray photoelectron spectroscopy (XPS); GaN;
D O I
10.1016/S0040-6090(98)01696-4
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A combination of ion implantation and plasma enhanced chemical vapour deposition (PECVD) has been used to synthesise amorphous gallium nitride (a-GaN). This was achieved by implanting PECVD amorphous silicon nitride (a-SiN(x):H) films with 75 keV Ga(+) ions at room temperature. A study of an entire range of a-SiN(x):H films with different compositions has enabled the choice of an optimum composition of the substrate for Ga implants. An FTIR study reveals the presence of GaN bond vibrations in the N rich samples. This complements the X-ray photoelectron spectroscopy results that confirm the presence of GaN bonds in samples. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:632 / 636
页数:5
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