Effects of Deposition Pressure on the Microstructure and Hardness of Ti/TiN Nanolayered Coatings

被引：2

作者：

Bai, Xiaoming ^{[1
]}

Zhang, Chengshun ^{[2
]}

She, Hui ^{[1
]}

Li, Chunping ^{[1
]}

Yu, Huamin ^{[1
]}

机构：

[1] Air Force Aviat Univ, Basic Flight Training Base, Changchun 130022, Peoples R China

[2] Changchun Univ Technol, Dept Mat Sci, Changchun 130012, Peoples R China

来源：

INTEGRATED FERROELECTRICS | 2013年 / 145卷 / 01期

基金：

美国国家科学基金会; 中国国家自然科学基金;

关键词：

Ti; TiN nanolayer; deposition pressure; hardness; modulus; ION-BEAM; TRIBOLOGICAL PROPERTIES; NITRIDE FILMS; NANOINDENTATION; TIN;

D O I：

10.1080/10584587.2013.788323

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The polycrystalline Ti/TiN multilayer films were deposited by magnetron sputtering. We investigated the effects of mixed discharge gas pressure on the microstructural, interfacial, and mechanical properties of the polycrystalline Ti/TiN multilayer films. X-ray reflectivity and diffraction (XRR and XRD), and nanoindentation were used to characterize the structures and mechanical properties for the films. It was found that the hardness enhancement is caused by the modulus difference in the interface between layer Ti and TiN. The elastic modulus is strongly related to the composition of crystalline orientation and distortion. The sharp interface is good for improving the mechanical properties for Ti/TiN multilayer.

引用

页码：32 / 39

页数：8

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