Upgraded vacuum arc ion source for metal ion implantation

被引：55

作者：

Nikolaev, A. G. ^{[1
]}

Oks, E. M. ^{[1
]}

Savkin, K. P. ^{[1
]}

Yushkov, G. Yu. ^{[1
]}

Brown, I. G. ^{[2
]}

机构：

[1] Russian Acad Sci, Inst High Current Elect, Siberian Div, Tomsk 634055, Russia

[2] Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Berkeley, CA 94720 USA

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 2012年 / 83卷 / 02期

基金：

俄罗斯基础研究基金会;

关键词：

Ion beams - Ion sources - Metals - Ion implantation - Vacuum applications - Vacuum technology;

D O I：

10.1063/1.3655529

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Vacuum arc ion sources have been made and used by a large number of research groups around the world over the past twenty years. The first generation of vacuum arc ion sources (dubbed "Mevva," for metal vapor vacuum arc) was developed at Lawrence Berkeley National Laboratory in the 1980s. This paper considers the design, performance parameters, and some applications of a new modified version of this kind of source which we have called Mevva-V.Ru. The source produces broad beams of metal ions at an extraction voltage of up to 60 kV and a time-averaged ion beam current in the milliampere range. Here, we describe the Mevva-V.Ru vacuum arc ion source that we have developed at Tomsk and summarize its beam characteristics along with some of the applications to which we have put it. We also describe the source performance using compound cathodes. (C) 2012 American Institute of Physics. [doi:10.1063/1.3655529]

引用

页数：3

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