Performance improvement of pentacene-based organic thin-film transistor with the planar bottom-contact structure and the bi-layer gate dielectric

被引:0
作者
Fan, Ching-Lin [1 ,2 ]
Lin, Zuo [2 ]
Huang, Chao-Hung [2 ]
机构
[1] Natl Taiwan Univ Sci & Technol, Grad Inst Electroopt Engn, 43 Sec 4,Keelung Rd, Taipei 106, Taiwan
[2] Natl Taiwan Univ Sci & Technol, Dept Elect Engn, Taipei 106, Taiwan
来源
2012 19TH INTERNATIONAL WORKSHOP ON ACTIVE-MATRIX FLATPANEL DISPLAYS AND DEVICES (AM-FPD): TFT TECHNOLOGIES AND FPD MATERIALS | 2012年
关键词
SHADOW-MASK; RESISTANCE; CHANNEL; ELECTRODES; REDUCTION;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This study reports the performance improvement of pentacene-based organic thin-film transistor (OTFT) with the proposed planar bottom-contact structure and the bi-layer gate dielectric. The planar bottom-contact (pBC) structure can provide a continuous plane to enhance the grain growth continuity of pentacene layer, further improving the charge carriers injection or/and transportation near the edge of source/drain electrodes; hence, the pBC structure reduces the contact resistance between the organic semiconductor and the source/drain metals, resulting in the improved field-effect mobility. In addition, the bi-layer gate dielectric is used for the etching selectivity to control the planarization process well.
引用
收藏
页码:199 / 202
页数:4
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