Light extraction from GaN-based light emitting diode structures with a noninvasive two-dimensional photonic crystal

被引：82

作者：

Truong, T. A. ^{[1
]}

Campos, L. M. ^{[2
,3
]}

Matioli, E. ^{[1
]}

Meinel, I. ^{[4
]}

Hawker, C. J. ^{[2
,3
,5
]}

Weisbuch, C. ^{[1
,6
]}

Petroff, P. M. ^{[1
,7
]}

机构：

[1] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA

[2] Univ Calif Santa Barbara, Mitsubishi Chem Ctr Adv Mat, Santa Barbara, CA 93106 USA

[3] Univ Calif Santa Barbara, Mat Res Lab, Santa Barbara, CA 93106 USA

[4] MC Res & Innovat Ctr, Goleta, CA 93117 USA

[5] Univ Calif Santa Barbara, Dept Chem & Biochem, Santa Barbara, CA 93106 USA

[6] Ecole Polytech, CNRS, Phys Mat Condensee Lab, UMR 7643, F-91228 Palaiseau, France

[7] Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA

来源：

APPLIED PHYSICS LETTERS | 2009年 / 94卷 / 02期

关键词：

etching; gallium compounds; III-V semiconductors; light emitting diodes; nanolithography; nanopatterning; photoluminescence; photonic crystals; semiconductor quantum wells; semiconductor thin films; soft lithography; titanium compounds; wide band gap semiconductors; IMPRINT LITHOGRAPHY; SOFT LITHOGRAPHY; EFFICIENCY; RESOLUTION;

D O I：

10.1063/1.3067837

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A noninvasive fabrication process involving soft nanoimprint lithography is used to pattern a photonic crystal (PhC) in titania film for enhanced light extraction from a GaN light emitting diode (LED). This technique avoids damaging the LED structure by the etching process, while photoluminescence measurements show extracted modes emitted from the quantum wells which agree well with modeling. A light extraction improvement of 1.8 times is measured using this noninvasive PhC.

引用

页数：3

共 15 条

[1] Impact of planar microcavity effects on light extraction - Part I: Basic concepts and analytical trends [J].

Benisty, H ;

De Neve, H ;

Weisbuch, C .

IEEE JOURNAL OF QUANTUM ELECTRONICS, 1998, 34 (09) :1612-1631

[2] Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol-ene Click Chemistry [J].

Campos, Luis M. ;

Meinel, Ines ;

Guino, Rosette G. ;

Schierhorn, Martin ;

Gupta, Nalini ;

Stucky, Galen D. ;

Hawker, Craig J. .

ADVANCED MATERIALS, 2008, 20 (19) :3728-+

[3] Imprint lithography with 25-nanometer resolution [J].

Chou, SY ;

Krauss, PR ;

Renstrom, PJ .

SCIENCE, 1996, 272 (5258) :85-87

[4] Photonic bands in two-dimensionally patterned multimode GaN waveguides for light extraction [J].

David, A ;

Meier, C ;

Sharma, R ;

Diana, FS ;

DenBaars, SP ;

Hu, E ;

Nakamura, S ;

Weisbuch, C ;

Benisty, H .

APPLIED PHYSICS LETTERS, 2005, 87 (10)

[5] Optimization of light-diffracting photonic-crystals for high extraction efficiency LEDs [J].

David, Aurelien ;

Benisty, Henri ;

Weisbuch, Claude .

JOURNAL OF DISPLAY TECHNOLOGY, 2007, 3 (02) :133-148

[6]

Diana FS, 2006, NANO LETT, V6, P1116, DOI 10.1021/nl060535b

[7] Increase in the extraction efficiency of GaN-based light-emitting diodes via surface roughening [J].

Fujii, T ;

Gao, Y ;

Sharma, R ;

Hu, EL ;

DenBaars, SP ;

Nakamura, S .

APPLIED PHYSICS LETTERS, 2004, 84 (06) :855-857

[8] The patterning of sub-500 nm inorganic oxide structures [J].

Hampton, Meredith J. ;

Williams, Stuart S. ;

Zhou, Zhilian ;

Nunes, Janine ;

Ko, Doo-Hyun ;

Templeton, Joseph L. ;

Samulski, Edward T. ;

DeSimone, Joseph M. .

ADVANCED MATERIALS, 2008, 20 (14) :2667-+

[9] Status and future of high-power light-emitting diodes for solid-state lighting [J].

Krames, Michael R. ;

Shchekin, Oleg B. ;

Mueller-Mach, Regina ;

Mueller, Gerd O. ;

Zhou, Ling ;

Harbers, Gerard ;

Craford, M. George .

JOURNAL OF DISPLAY TECHNOLOGY, 2007, 3 (02) :160-175

[10] Micro- and nanopatterning techniques for organic electronic and optoelectronic systems [J].

Menard, Etienne ;

Meitl, Matthew A. ;

Sun, Yugang ;

Park, Jang-Ung ;

Shir, Daniel Jay-Lee ;

Nam, Yun-Suk ;

Jeon, Seokwoo ;

Rogers, John A. .

CHEMICAL REVIEWS, 2007, 107 (04) :1117-1160

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