Ferroelectric properties of epitaxial BaTiO3 thin films and heterostructures on different substrates -: art. no. 114101

被引：69
作者：
Trithaveesak, O
Schubert, J [1 ]
Buchal, C
机构：
[1] Forschungszentrum Julich, Inst Schichten & Grenzflachen, ISGI IT, D-52425 Julich, Germany
[2] Forschungszentrum Julich, Ctr Nanoelect Syst Informat Technol, CNI, D-52425 Julich, Germany
来源：
JOURNAL OF APPLIED PHYSICS | 2005年 / 98卷 / 11期
关键词：
D O I：
10.1063/1.2135891
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Ferroelectric thin films of BaTiO3 and BaTiO3/SrRuO3 epitaxial heterostructures on different single-crystalline substrates were fabricated by pulsed laser deposition. The BaTiO3 films of 100-400 nm thickness show high structural perfection and c-axis-oriented growth. For the electrical characterization of the BaTiO3 in a thin-film capacitor structure, Pt top electrodes were deposited by e-beam evaporation. The results are compared to the current experimental and theoretical models. Special consideration is given to the model of charge injection from the electrodes.
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