Micromachining of ultrananocrystalline diamond

被引：12

作者：

Moldovan, N ^{[1
]}

Auciello, O ^{[1
]}

Sumant, AV ^{[1
]}

Carlisle, JA ^{[1
]}

Divan, R ^{[1
]}

Gruen, DM ^{[1
]}

Krauss, AR ^{[1
]}

Mancini, DC ^{[1
]}

Jayatissa, A ^{[1
]}

Tucek, J ^{[1
]}

机构：

[1] Argonne Natl Lab, Expt Facil Div, Argonne, IL 60439 USA

来源：

MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY VII | 2001年 / 4557卷

关键词：

D O I：

10.1117/12.442958

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Ultrananocrystalline diamond (UNCD) with grain sizes in the range of 2-5 run is produced using a microwave plasma chemical vapor deposition process with argon-rich C-60 or CH4 plasmas. This material has excellent mechanical properties: high hardness and Young modulus, and an extremely low friction coefficient (similar to0.01). It is resistant to chemical attack, and is potentially biocompatible. These properties make UNCD a very good candidate for a diamond-based microelectromechanical systems (MEMS) technology. We report on the micromachinability of this material by selective seeding, selective growth and reactive ion etching, in conjunction with SiO2 sacrificial layers for fabricating 3-D structures with freestanding or movable parts. These micromachining techniques are used to develop a totally UNCD-made turbine as a demonstration for UNCD-based MEMS.

引用

页码：288 / 298

页数：11

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